Handbook of Silicon Wafer Cleaning Technology

Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process

Produk Detail:

  • Author : Karen Reinhardt
  • Publisher : William Andrew
  • Pages : 760 pages
  • ISBN : 032351085X
  • Rating : 4/5 from 21 reviews
CLICK HERE TO GET THIS BOOKHandbook of Silicon Wafer Cleaning Technology

Handbook of Silicon Wafer Cleaning Technology

Handbook of Silicon Wafer Cleaning Technology
  • Author : Karen Reinhardt,Werner Kern
  • Publisher : William Andrew
  • Release : 16 March 2018
GET THIS BOOKHandbook of Silicon Wafer Cleaning Technology

Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning.

Handbook of Silicon Wafer Cleaning Technology, 2nd Edition

Handbook of Silicon Wafer Cleaning Technology, 2nd Edition
  • Author : Karen Reinhardt,Werner Kern
  • Publisher : William Andrew
  • Release : 10 December 2008
GET THIS BOOKHandbook of Silicon Wafer Cleaning Technology, 2nd Edition

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both

Handbook of Semiconductor Wafer Cleaning Technology

Handbook of Semiconductor Wafer Cleaning Technology
  • Author : Werner Kern
  • Publisher : William Andrew
  • Release : 09 May 1993
GET THIS BOOKHandbook of Semiconductor Wafer Cleaning Technology

"The cleaning of semiconductor wafers has become one of the most critical operations in the fabrication of semiconductor devices. The considerable body of technical and scientific literature is widely dispersed in numerous journals and symposia proceedings. This book brings together in one volume all pertinent knowledge on semiconductor wafer cleaning and its associated scientific and technical disciplines. It provides the first comprehensive and up-to-date coverage of this rapidly evolving field. Its thirteen chapters were written by nineteen scientists who are

Handbook of Silicon Wafer Cleaning Technology, 2nd Edition

Handbook of Silicon Wafer Cleaning Technology, 2nd Edition
  • Author : Karen Reinhardt,Werner Kern
  • Publisher : William Andrew
  • Release : 10 December 2008
GET THIS BOOKHandbook of Silicon Wafer Cleaning Technology, 2nd Edition

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both

Handbook of Silicon Wafer Cleaning Technology, 2nd Edition

Handbook of Silicon Wafer Cleaning Technology, 2nd Edition
  • Author : Karen Reinhardt,Werner Kern
  • Publisher : William Andrew
  • Release : 10 December 2008
GET THIS BOOKHandbook of Silicon Wafer Cleaning Technology, 2nd Edition

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both

Handbook of Silicon Wafer Cleaning Technology, 2nd Edition

Handbook of Silicon Wafer Cleaning Technology, 2nd Edition
  • Author : Karen Reinhardt,Werner Kern
  • Publisher : William Andrew
  • Release : 10 December 2008
GET THIS BOOKHandbook of Silicon Wafer Cleaning Technology, 2nd Edition

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both

Handbook of Silicon Based MEMS Materials and Technologies

Handbook of Silicon Based MEMS Materials and Technologies
  • Author : Markku Tilli,Mervi Paulasto-Krockel,Veli-Matti Airaksinen,Sami Franssila,Veikko Lindroos,Ari Lehto,Teruaki Motooka
  • Publisher : Elsevier
  • Release : 08 December 2009
GET THIS BOOKHandbook of Silicon Based MEMS Materials and Technologies

A comprehensive guide to MEMS materials, technologies and manufacturing, examining the state of the art with a particular emphasis on current and future applications. Key topics covered include: Silicon as MEMS material Material properties and measurement techniques Analytical methods used in materials characterization Modeling in MEMS Measuring MEMS Micromachining technologies in MEMS Encapsulation of MEMS components Emerging process technologies, including ALD and porous silicon Written by 73 world class MEMS contributors from around the globe, this volume covers materials selection as

Handbook for Cleaning for Semiconductor Manufacturing

Handbook for Cleaning for Semiconductor Manufacturing
  • Author : Karen A. Reinhardt,Richard F. Reidy
  • Publisher : John Wiley & Sons
  • Release : 12 April 2011
GET THIS BOOKHandbook for Cleaning for Semiconductor Manufacturing

This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive

Handbook for Cleaning for Semiconductor Manufacturing

Handbook for Cleaning for Semiconductor Manufacturing
  • Author : Karen A. Reinhardt,Richard F. Reidy
  • Publisher : Wiley-Scrivener
  • Release : 11 January 2011
GET THIS BOOKHandbook for Cleaning for Semiconductor Manufacturing

This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive

Ultraclean Surface Processing of Silicon Wafers

Ultraclean Surface Processing of Silicon Wafers
  • Author : Takeshi Hattori
  • Publisher : Springer Science & Business Media
  • Release : 09 March 2013
GET THIS BOOKUltraclean Surface Processing of Silicon Wafers

A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production.

Handbook of Semiconductor Manufacturing Technology

Handbook of Semiconductor Manufacturing Technology
  • Author : Yoshio Nishi,Robert Doering
  • Publisher : CRC Press
  • Release : 19 December 2017
GET THIS BOOKHandbook of Semiconductor Manufacturing Technology

Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available.

Handbook of Silicon Photonics

Handbook of Silicon Photonics
  • Author : Laurent Vivien,Lorenzo Pavesi
  • Publisher : Taylor & Francis
  • Release : 19 April 2016
GET THIS BOOKHandbook of Silicon Photonics

The development of integrated silicon photonic circuits has recently been driven by the Internet and the push for high bandwidth as well as the need to reduce power dissipation induced by high data-rate signal transmission. To reach these goals, efficient passive and active silicon photonic devices, including waveguide, modulators, photodetectors,

Semiconductor Manufacturing Handbook

Semiconductor Manufacturing Handbook
  • Author : Hwaiyu Geng
  • Publisher : McGraw Hill Professional
  • Release : 27 April 2005
GET THIS BOOKSemiconductor Manufacturing Handbook

This handbook will provide engineers with the principles, applications, and solutions needed to design and manage semiconductor manufacturing operations. Consolidating the many complex fields of semiconductor fundamentals and manufacturing into one volume by deploying a team of world class specialists, it allows the quick look up of specific manufacturing reference data across many subdisciplines.