Laser Annealing Processes in Semiconductor Technology

Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors

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  • Author : Fuccio Cristiano
  • Publisher : Woodhead Publishing
  • Pages : 426 pages
  • ISBN : 0128202564
  • Rating : 4/5 from 21 reviews
CLICK HERE TO GET THIS BOOKLaser Annealing Processes in Semiconductor Technology

Laser Annealing Processes in Semiconductor Technology

Laser Annealing Processes in Semiconductor Technology
  • Author : Fuccio Cristiano,Antonino La Magna
  • Publisher : Woodhead Publishing
  • Release : 21 April 2021
GET THIS BOOKLaser Annealing Processes in Semiconductor Technology

Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal

Point Defects in Materials

Point Defects in Materials
  • Author : F. Agulló-López,Charles Richard Arthur Catlow,Peter David Townsend
  • Publisher : Unknown Publisher
  • Release : 23 May 1988
GET THIS BOOKPoint Defects in Materials

This text provides an up-to-date coverage of the theoretical and experimental tools required for fundamental studies of point defects, with illustrative examples from a wide range of inorganic materials. On the experimental side a strong emphasis is placed on the powerful resonance and hyperfine methods which give detailed information on defect structures. Theoretical chapters cover statistical and quantum mechanical methods, particularly the computer simulations techniques which are now widely employed. The examples of applications of defect properties highlight the benefits

Advances in Laser Materials Processing

Advances in Laser Materials Processing
  • Author : J. R. Lawrence
  • Publisher : Woodhead Publishing
  • Release : 20 September 2017
GET THIS BOOKAdvances in Laser Materials Processing

Advances in Laser Materials Processing: Technology, Research and Application, Second Edition, provides a revised, updated and expanded overview of the area, covering fundamental theory, technology and methods, traditional and emerging applications and potential future directions. The book begins with an overview of the technology and challenges to applying the technology in manufacturing. Parts Two thru Seven focus on essential techniques and process, including cutting, welding, annealing, hardening and peening, surface treatments, coating and materials deposition. The final part of the

Ion Implantation in Semiconductors 1976

Ion Implantation in Semiconductors 1976
  • Author : Fred Chernow
  • Publisher : Springer Science & Business Media
  • Release : 06 December 2012
GET THIS BOOKIon Implantation in Semiconductors 1976

The Fifth International Conference on Ion Implantation took place in Boulder, Colorado between the 9th and 13th of August 1976. Papers were delivered by scientists and engineers from 15 countries, and the attendees represented 19 countries. As has become the custom at these conferences, the sessions were intense with the coffee breaks and evenings given to informal meetings among the participants. It was a time to renew old friendships, begin new ones, exchange ideas, personally question authors of papers that appeared in the

Laser Annealing of Semiconductors

Laser Annealing of Semiconductors
  • Author : J Poate
  • Publisher : Elsevier
  • Release : 02 December 2012
GET THIS BOOKLaser Annealing of Semiconductors

Laser Annealing of Semiconductors deals with the materials science of surfaces that have been subjected to ultrafast heating by intense laser or electron beams. This book is organized into 13 chapters that specifically tackle transient annealing of compound semiconductors. After briefly dealing with an overview of laser annealing, this book goes on discussing the concepts of solidification and crystallization pertinent to the field. These topics are followed by discussions on the main mechanisms of interaction of photon and electron beams with

Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9

Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9
  • Author : F. Roozeboom,P. J. Timans,K. Kakushima,E. Gusev,Z. Karim,D. Misra,Y. S. Obeng,S. De Gendt,H. Jagannathan
  • Publisher : The Electrochemical Society
  • Release : 17 May 2019
GET THIS BOOKSilicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9

This issue of ECS Transactions includes papers based on presentations from the symposium "Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9," originally held at the 235th ECS Meeting in Dallas, Texas, May 26-30, 2019.

Laser-Assisted Microtechnology

Laser-Assisted Microtechnology
  • Author : Simeon M. Metev,Vadim P. Veiko
  • Publisher : Springer Science & Business Media
  • Release : 09 March 2013
GET THIS BOOKLaser-Assisted Microtechnology

Laser-Assisted Microtechnology introduces the principles and techniques of laser-assisted microtechnology with emphasis on micromachining of thin films, microprocessing of materials, maskless laser micropatterning and laser-assisted synthesis of thin-film systems. The experimental and theoretical physico-chemical basis of every technological process is presented in detail. On the basis of some characteristic examples of applications, the capabilities of the technological methods as well as the optimum conditions for their realization are discussed. In this second edition, besides the actualization of the literature, a

Ultraviolet Laser Technology and Applications

Ultraviolet Laser Technology and Applications
  • Author : David L. Elliott
  • Publisher : Academic Press
  • Release : 28 June 2014
GET THIS BOOKUltraviolet Laser Technology and Applications

Ultraviolet Laser Technology and Applications is a hands-on reference text that identifies the main areas of UV laser technology; describes how each is applied; offers clearly illustrated examples of UV opticalsystems applications; and includes technical data on optics, lasers, materials, and systems. This book is unique for its comprehensive, in-depth coverage. Each chapter deals with a different aspect of the subject, beginning with UV light itself; moving through the optics, sources, and systems; and concluding with detailed descriptions of applications

ULSI Semiconductor Technology Atlas

ULSI Semiconductor Technology Atlas
  • Author : Chih-Hang Tung,George T. T. Sheng,Chih-Yuan Lu
  • Publisher : John Wiley & Sons
  • Release : 06 October 2003
GET THIS BOOKULSI Semiconductor Technology Atlas

More than 1,100 TEM images illustrate the science of ULSI The natural outgrowth of VLSI (Very Large Scale Integration), Ultra Large Scale Integration (ULSI) refers to semiconductor chips with more than 10 million devices per chip. Written by three renowned pioneers in their field, ULSI Semiconductor Technology Atlas uses examples and TEM (Transmission Electron Microscopy) micrographs to explain and illustrate ULSI process technologies and their associated problems. The first book available on the subject to be illustrated using TEM images, ULSI Semiconductor

Zinc Compounds—Advances in Research and Application: 2013 Edition

Zinc Compounds—Advances in Research and Application: 2013 Edition
  • Author : Anonim
  • Publisher : ScholarlyEditions
  • Release : 21 June 2013
GET THIS BOOKZinc Compounds—Advances in Research and Application: 2013 Edition

Zinc Compounds—Advances in Research and Application: 2013 Edition is a ScholarlyBrief™ that delivers timely, authoritative, comprehensive, and specialized information about ZZZAdditional Research in a concise format. The editors have built Zinc Compounds—Advances in Research and Application: 2013 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about ZZZAdditional Research in this book to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Zinc Compounds—

Subsecond Annealing of Advanced Materials

Subsecond Annealing of Advanced Materials
  • Author : Wolfgang Skorupa,Heidemarie Schmidt
  • Publisher : Springer Science & Business Media
  • Release : 16 December 2013
GET THIS BOOKSubsecond Annealing of Advanced Materials

The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes