New Approaches to Image Processing based Failure Analysis of Nano Scale ULSI Devices

New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can’t keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise. This book presents novel "smart" image processing methods, applications, and case studies concerning quality improvement of microscope images of microelectronic chips and process optimization. It explains an approach for high-resolution imaging of advanced metallization for micro- and nanoelectronics. This approach obviates the time-consuming preparation and selection of microscope measurement and sample conditions, enabling not only better electron-microscopic resolution, but also more efficient testing and quality control. This in turn leads to productivity gains in design and development of nano-scale ULSI chips. The authors also present several approaches for super-resolving low-resolution images to improve failure analysis of microelectronic chips. Acquaints users with new software-based approaches to enhance high-resolution microscope imaging of microchip structures Demonstrates how these methods lead to productivity gains in the development of ULSI chips Presents several techniques for the superresolution of images, enabling engineers and scientists to improve their results in failure analysis of microelectronic chips

Produk Detail:

  • Author : Zeev Zalevsky
  • Publisher : William Andrew
  • Pages : 110 pages
  • ISBN : 0128000171
  • Rating : 4/5 from 21 reviews
CLICK HERE TO GET THIS BOOKNew Approaches to Image Processing based Failure Analysis of Nano Scale ULSI Devices

New Approaches to Image Processing based Failure Analysis of Nano-Scale ULSI Devices

New Approaches to Image Processing based Failure Analysis of Nano-Scale ULSI Devices
  • Author : Zeev Zalevsky,Pavel Livshits,Eran Gur
  • Publisher : William Andrew
  • Release : 13 November 2013
GET THIS BOOKNew Approaches to Image Processing based Failure Analysis of Nano-Scale ULSI Devices

New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can’t keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise. This

Characterization and Metrology for ULSI Technology 2005

Characterization and Metrology for ULSI Technology 2005
  • Author : David G. Seiler,Alain C. Diebold,Robert McDonald,Caroline R. Ayre,Rajinder P. Khosla,Stefan Zollner,Erik M. Secula
  • Publisher : American Institute of Physics
  • Release : 29 September 2005
GET THIS BOOKCharacterization and Metrology for ULSI Technology 2005

The worldwide semiconductor community faces increasingly difficult challenges in the era of silicon nanotechnology and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed. Characterization and metrology are key enablers for developing new semiconductor technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continuing

Characterization and Metrology for ULSI Technology: 2003

Characterization and Metrology for ULSI Technology: 2003
  • Author : David G. Seiler,Alain C. Diebold,Thomas J. Shaffner,Robert McDonald,Stefan Zollner,Rajinder P. Khosla,Eric M. Secula
  • Publisher : American Institute of Physics
  • Release : 08 October 2003
GET THIS BOOKCharacterization and Metrology for ULSI Technology: 2003

The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed. Topics include: integrated circuit history, challenges and overviews, front end, lithography, interconnect and back end, and critical analytical techniques. Characterization and metrology are key enablers for