Thin Film Growth

Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films. Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. Part two covers some of the techniques used for thin film growth, including oblique angle deposition, reactive magnetron sputtering and epitaxial growth of graphene films on single crystal metal surfaces. This section also includes chapters on the properties of thin films, covering topics such as substrate plasticity and buckling of thin films, polarity control, nanostructure growth dynamics and network behaviour in thin films. With its distinguished editor and international team of contributors, Thin film growth is an essential reference for engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic. Provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films Focusses on the theory and modelling of thin film growth, techniques and mechanisms used for thin film growth and properties of thin films An essential reference for engineers in electronics, energy materials and mechanical engineering

Produk Detail:

  • Author : Zexian Cao
  • Publisher : Elsevier
  • Pages : 432 pages
  • ISBN : 0857093290
  • Rating : 4/5 from 21 reviews
CLICK HERE TO GET THIS BOOKThin Film Growth

Thin Film Growth

Thin Film Growth
  • Author : Zexian Cao
  • Publisher : Elsevier
  • Release : 18 July 2011
GET THIS BOOKThin Film Growth

Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films. Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field

In Situ Characterization of Thin Film Growth

In Situ Characterization of Thin Film Growth
  • Author : Gertjan Koster,Guus Rijnders
  • Publisher : Elsevier
  • Release : 05 October 2011
GET THIS BOOKIn Situ Characterization of Thin Film Growth

Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on

Thin Film Growth: Physics, Materials Science and Applications

Thin Film Growth: Physics, Materials Science and Applications
  • Author : Zexian Cao
  • Publisher : Woodhead Publishing
  • Release : 01 August 2011
GET THIS BOOKThin Film Growth: Physics, Materials Science and Applications

Thin-film technology is used in many applications such as microelectronics, optics, magnetics, hard and corrosion resistant coatings, and micromechanics. This book provides a review of the theory and techniques for the deposition of thin films. It helps the reader understand the variables affecting growth kinetics and microstructural evolution during deposition.

Surface Science

Surface Science
  • Author : K. Oura,V.G. Lifshits,A.A. Saranin,A.V. Zotov,M. Katayama
  • Publisher : Springer Science & Business Media
  • Release : 14 March 2013
GET THIS BOOKSurface Science

The most important aspects of modern surface science are covered. All topics are presented in a concise and clear form accessible to a beginner. At the same time, the coverage is comprehensive and at a high technical level, with emphasis on the fundamental physical principles. Numerous examples, references, practice exercises, and problems complement this remarkably complete treatment, which will also serve as an excellent reference for researchers and practitioners. The textbook is idea for students in engineering and physical sciences.

Principles of Vapor Deposition of Thin Films

Principles of Vapor Deposition of Thin Films
  • Author : Professor K.S. K.S Sree Harsha
  • Publisher : Elsevier
  • Release : 16 December 2005
GET THIS BOOKPrinciples of Vapor Deposition of Thin Films

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of

The Materials Science of Semiconductors

The Materials Science of Semiconductors
  • Author : Angus Rockett
  • Publisher : Springer Science & Business Media
  • Release : 20 November 2007
GET THIS BOOKThe Materials Science of Semiconductors

This book describes semiconductors from a materials science perspective rather than from condensed matter physics or electrical engineering viewpoints. It includes discussion of current approaches to organic materials for electronic devices. It further describes the fundamental aspects of thin film nucleation and growth, and the most common physical and chemical vapor deposition techniques. Examples of the application of the concepts in each chapter to specific problems or situations are included, along with recommended readings and homework problems.

Evolution of Thin Film Morphology

Evolution of Thin Film Morphology
  • Author : Matthew Pelliccione,Toh-Ming Lu
  • Publisher : Springer Science & Business Media
  • Release : 29 January 2008
GET THIS BOOKEvolution of Thin Film Morphology

The focus of this book is on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition. It will benefit those working in any discipline that requires an understanding of thin film growth processes.

Pulsed Laser Deposition of Thin Films

Pulsed Laser Deposition of Thin Films
  • Author : Robert Eason
  • Publisher : John Wiley & Sons
  • Release : 14 December 2007
GET THIS BOOKPulsed Laser Deposition of Thin Films

Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.

Low Energy Ion Assisted Film Growth

Low Energy Ion Assisted Film Growth
  • Author : A R González-Elipe,F Yubero,J M Sanz
  • Publisher : World Scientific
  • Release : 21 March 2003
GET THIS BOOKLow Energy Ion Assisted Film Growth

This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening

Modern Technologies for Creating the Thin-film Systems and Coatings

Modern Technologies for Creating the Thin-film Systems and Coatings
  • Author : Nikolay Nikitenkov
  • Publisher : BoD – Books on Demand
  • Release : 08 March 2017
GET THIS BOOKModern Technologies for Creating the Thin-film Systems and Coatings

Development of the thin film and coating technologies (TFCT) made possible the technological revolution in electronics and through it the revolution in IT and communications in the end of the twentieth century. Now, TFCT penetrated in many sectors of human life and industry: biology and medicine; nuclear, fusion, and hydrogen energy; protection against corrosion and hydrogen embrittlement; jet engine; space materials science; and many others. Currently, TFCT along with nanotechnologies is the most promising for the development of almost all

Sputtered Thin Films

Sputtered Thin Films
  • Author : Frederick Madaraka Mwema,Esther Titilayo Akinlabi,Oluseyi Philip Oladijo
  • Publisher : CRC Press
  • Release : 12 April 2021
GET THIS BOOKSputtered Thin Films

Sputtered Thin Films: Theory and Fractal Descriptions provides an overview of sputtered thin films and demystifies the concept of fractal theory in analysis of sputtered thin films. It simplifies the use of fractal tools in studying the growth and properties of thin films during sputtering processes. Part 1 of the book describes the basics and theory of thin film sputtering and fractals. Part 2 consists of examples illustrating specific descriptions of thin films using fractal methods. Discusses thin film growth, structure, and

Advanced Techniques for Surface Engineering

Advanced Techniques for Surface Engineering
  • Author : W. Gissler,H.A. Jehn
  • Publisher : Springer Science & Business Media
  • Release : 17 April 2013
GET THIS BOOKAdvanced Techniques for Surface Engineering

Today's shortages of resources make the search for wear and corrosion resistant materials one of the most important tasks of the next century. Since the surface of a material is the location where any interaction occurs, it is that there the hardest requirements on the material are imposed: to be wear resistant for tools and bearings; to be corrosion resistant for turbine blades and tubes in the petrochemical industry; to be antireflecting for solar cells; to be decorative for architectural

Thin Film Growth Techniques for Low-Dimensional Structures

Thin Film Growth Techniques for Low-Dimensional Structures
  • Author : R.F.C. Farrow,S.S.P. Parkin,P.J. Dobson,J.H. Neave,A.S. Arrott
  • Publisher : Springer Science & Business Media
  • Release : 09 March 2013
GET THIS BOOKThin Film Growth Techniques for Low-Dimensional Structures

This work represents the account of a NATO Advanced Research Workshop on "Thin Film Growth Techniques for Low Dimensional Structures", held at the University of Sussex, Brighton, England from 15-19 Sept. 1986. The objective of the workshop was to review the problems of the growth and characterisation of thin semiconductor and metal layers. Recent advances in deposition techniques have made it possible to design new material which is based on ultra-thin layers and this is now posing challenges for scientists, technologists

Thin Film Growth Techniques for Low-Dimensional Structures

Thin Film Growth Techniques for Low-Dimensional Structures
  • Author : R.F.C. Farrow,S.S.P. Parkin,P.J. Dobson,J.H. Neave,A.S. Arrott
  • Publisher : Springer
  • Release : 28 December 2012
GET THIS BOOKThin Film Growth Techniques for Low-Dimensional Structures

This work represents the account of a NATO Advanced Research Workshop on "Thin Film Growth Techniques for Low Dimensional Structures", held at the University of Sussex, Brighton, England from 15-19 Sept. 1986. The objective of the workshop was to review the problems of the growth and characterisation of thin semiconductor and metal layers. Recent advances in deposition techniques have made it possible to design new material which is based on ultra-thin layers and this is now posing challenges for scientists, technologists

An Improved Model of Thin Film Growth

An Improved Model of Thin Film Growth
  • Author : David J. Doryland,AIR FORCE INST OF TECH WRIGHT-PATTERSON AFB OH SCHOOL OF ENGINEERING.
  • Publisher : Unknown Publisher
  • Release : 19 October 1985
GET THIS BOOKAn Improved Model of Thin Film Growth

A VAX-11/785 computer was used to simulate the two dimensional growth of thin films produced by vapor deposition. In this model molecules and impurities were represented by three different sized disks. In order to simulate varying deposition conditions and evaporants, several variable parameters were introduced. Among these parameters were the variation of the deposition angle about some main angle, the mobility of the disks upon collision, the ability to introduce impurities into the microstructure, the simulation of multilayered coatings and